Image:Isolation pitch vs design rule.PNG

The graph is based directly on data (presented at five IEDM conferences) from Intel process technology from the 180 to 32 nm nodes.S. Yang et al., IEDM 1998.S. Tyagi et al., IEDM 2000.S. Thompson et al., IEDM 2002.P. Bai et al., IEDM 2004.K. Mistry et al., IEDM 2007.S. Natarajan et al., IEDM 2008.