Trifluorosilane
{{Chembox
| ImageFile = SiHF3 13465-71-9.svg
| ImageSize = 120px
| ImageFileL1 = SiHF3 Ball and Stick cropped.png
| ImageFileR1 = SiHF3 spacefill cropped.png
| IUPACName = Trifluorosilane
| Section1 = {{Chembox Identifiers
| ChemSpiderID_Ref = {{chemspidercite|correct|chemspider}}
| ChemSpiderID = 122985
| InChI = 1S/F3HSi/c1-4(2)3/h4H
| InChIKey = ZDHXKXAHOVTTAH-UHFFFAOYAH
| StdInChI_Ref = {{stdinchicite|correct|chemspider}}
| StdInChI = InChI=1S/F3HSi/c1-4(2)3/h4H
| StdInChIKey_Ref = {{stdinchicite|correct|chemspider}}
| StdInChIKey = WPPVEXTUHHUEIV-UHFFFAOYSA-N
| CASNo = 13465-71-9
| CASNo_Ref = {{cascite|correct|CAS}}
| PubChem = 139462
| SMILES = F[SiH](F)F
}}
| Section2 = {{Chembox Properties
| Formula = HF3Si
| MolarMass = {{val|86.09|u=g/mol}}
| Appearance = Colorless gas
| Density = 1.86 g/cm3
| MeltingPtC = -131
| BoilingPtC = -97.5
| Solubility =
}}
}}
Trifluorosilane is the chemical compound with the formula F3HSi. At standard temperature and pressure, trifluorosilane is a colorless gas.{{Cite book
| publisher = CRC Press
| isbn = 9781439814628
| last = Perry
| first = Dale L.
| title = Handbook of Inorganic Compounds, Second Edition
| date = 2011-06-15
}} Note that the free radical F3Si is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.
Preparation
Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3.{{Cite book
| publisher = John Wiley & Sons
| isbn = 9780470145388
| last = Zuckerman
| first = J. J.
| title = Inorganic Reactions and Methods, The Formation of Bonds to Halogens
| date = 2009-09-17
}} HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C.
Formation has also been reported in certain etching operations of silicon.{{Cite journal
| doi = 10.1002/ejic.201200674
| issn = 1434-1948
| volume = 2012
| issue = 34
| pages = 5714–5721
| last1 = Lippold
| first1 = Marcus
| first2 = Uwe | last2 = Böhme | first3 = Christoph | last3= Gondek | first4 = Martin | last4 = Kronstein | first5= Sebastian | last5 = Patzig-Klein | first6 = Martin | last6 = Weser | first7 = Edwin | last7 = Kroke
| title = Etching Silicon with HF-HNO 3 -H 2 SO 4 /H 2 O Mixtures - Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si-F Surface Groups
| journal = European Journal of Inorganic Chemistry
| accessdate = 2014-08-27
| date = December 2012
| url = http://doi.wiley.com/10.1002/ejic.201200674
}}
Properties
The electric dipole moment of trifluorosilane is 1.26 debye.{{cite journal |last1=Ghosh |first1=S. N. |last2=Trambarulo |first2=Ralph |last3=Gordy |first3=Walter |title=Electric Dipole Moments of Several Molecules from the Stark Effect |journal=The Journal of Chemical Physics |date=February 1953 |volume=21 |issue=2 |pages=308–310 |doi=10.1063/1.1698877|bibcode=1953JChPh..21..308G }} The length of the silicon to fluorine bond is 1.555 Å, Si-H length is 1.55 Å, and ∠FSiF is 110°.{{cite journal |last1=Sheridan |first1=John |last2=Gordy |first2=Walter |title=Microwave Spectra and Molecular Constants of Trifluorosilane Derivatives. Si F 3 H, Si F 3 C H 3 , Si F 3 Cl, and Si F 3 Br |journal=Physical Review |date=1 March 1950 |volume=77 |issue=5 |pages=719 |doi=10.1103/PhysRev.77.719|bibcode=1950PhRv...77..719S }}
References
{{reflist}}
Further reading
- {{cite journal |last1=Demaison |first1=J. |last2=Margulès |first2=L. |last3=Breidung |first3=J. |last4=Thiel |first4=W. |last5=Bürger |first5=H. |title=Ab initio anharmonic force field, spectroscopic parameters and equilibrium structure of trifluorosilane |journal=Molecular Physics |date=10 November 1999 |volume=97 |issue=9 |pages=1053–1067 |doi=10.1080/00268979909482906|bibcode=1999MolPh..97.1053D }}
{{silicon compounds}}