Journal of Vacuum Science and Technology
{{Infobox journal
| title = Journal of Vacuum Science and Technology
| image =
| caption =
| former_name =
| abbreviation = J. Vac. Sci. Technol.
| discipline = Physics
| language = English
| editor = Eray Aydil
| publisher = American Institute of Physics on behalf of the American Vacuum Society
| country = United States
| history = 1964–present
| frequency = Bimonthly
| openaccess =
| license =
| impact = 2.4 (Part A)
1.5 (Part B)
| impact-year = 2023
| ISSNlabel = Journal of Vacuum Science and Technology
| ISSN = 0022-5355
| eISSN =
| CODEN =
| JSTOR =
| LCCN =
| OCLC =
| ISSNlabel2 = Journal of Vacuum Science and Technology A
| ISSN2 = 0734-2101
| eISSN2 = 1520-8559
| CODEN2 = JVTAD6
| JSTOR2 =
| LCCN2 = 83643441
| OCLC2 = 08697396
| ISSNlabel3 = Journal of Vacuum Science and Technology B
| ISSN3 = 0734-211X
| eISSN3 =
| CODEN3 = JVTBD9
| JSTOR3 =
| LCCN3 = 83642371
| OCLC3 = 08697479
| website = http://scitation.aip.org/content/avs/journal/jvst
| link1 = http://scitation.aip.org/content/avs/journal/jvsta
| link1-name = Part A
| link2 = http://scitation.aip.org/content/avs/journal/jvstb
| link2-name = Part B
}}
The Journal of Vacuum Science and Technology is a peer-reviewed scientific journal published in two parts, A and B, by the American Institute of Physics on behalf of the American Vacuum Society. It was established in 1964 and the editor-in-chief is Eray Aydil (University of Minnesota).
History
- 1964–1982 Journal of Vacuum Science and Technology
- 1983–present Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 1983–1990 Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
- 1991–present Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Part ''A''
Part A covers applied surface science, electronic materials and processing, fusion technology, plasma technology, surface science, thin films, vacuum metallurgy, and vacuum technology. According to the Journal Citation Reports, the journal has a 2015 impact factor of 1.724.{{cite book |year=2016 |chapter=Journal of Vacuum Science and Technology, Part A |title=2015 Journal Citation Reports |publisher=Thomson Reuters |edition=Science |series=Web of Science|title-link=Journal Citation Reports }}
Part ''B''
Part B covers vacuum and plasma processing of various materials, their structural characterization, microlithography, and the physics and chemistry of submicrometer and nanometer structures and devices. According to the Journal Citation Reports, the journal has a 2014 impact factor of 1.398.{{cite book |year=2016 |chapter=Journal of Vacuum Science and Technology, Part B |title=2015 Journal Citation Reports |publisher=Thomson Reuters |edition=Science |series=Web of Science|title-link=Journal Citation Reports }}
References
{{Reflist}}
External links
- {{Official website|http://scitation.aip.org/content/avs/journal/jvst}}
Category:English-language journals
Category:Academic journals established in 1964
Category:American Institute of Physics academic journals
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