List of semiconductor materials#Table of semiconductor alloy systems
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Semiconductor materials are nominally small band gap insulators. The defining property of a semiconductor material is that it can be compromised by doping it with impurities that alter its electronic properties in a controllable way.{{cite book|chapter=Control of Semiconductor Conductivity by Doping|author=Jones, E.D.|title=Electronic Materials |editor=Miller, L. S. |editor2=Mullin, J. B.|publisher=Plenum Press|place=New York|year=1991|pages=155–171|isbn=978-1-4613-6703-1|doi=10.1007/978-1-4615-3818-9_12}}
Because of their application in the computer and photovoltaic industry—in devices such as transistors, lasers, and solar cells—the search for new semiconductor materials and the improvement of existing materials is an important field of study in materials science.
Most commonly used semiconductor materials are crystalline inorganic solids. These materials are classified according to the periodic table groups of their constituent atoms.
Different semiconductor materials differ in their properties. Thus, in comparison with silicon, compound semiconductors have both advantages and disadvantages. For example, gallium arsenide (GaAs) has six times higher electron mobility than silicon, which allows faster operation; wider band gap, which allows operation of power devices at higher temperatures, and gives lower thermal noise to low power devices at room temperature; its direct band gap gives it more favorable optoelectronic properties than the indirect band gap of silicon; it can be alloyed to ternary and quaternary compositions, with adjustable band gap width, allowing light emission at chosen wavelengths, which makes possible matching to the wavelengths most efficiently transmitted through optical fibers. GaAs can be also grown in a semi-insulating form, which is suitable as a lattice-matching insulating substrate for GaAs devices. Conversely, silicon is robust, cheap, and easy to process, whereas GaAs is brittle and expensive, and insulation layers cannot be created by just growing an oxide layer; GaAs is therefore used only where silicon is not sufficient.Milton Ohring [https://books.google.com/books?id=gxSyMjosCwcC&dq=semiconductor+failure+microphotograph&pg=PA310 Reliability and failure of electronic materials and devices] Academic Press, 1998, {{ISBN|0-12-524985-3}}, p. 310.
By alloying multiple compounds, some semiconductor materials are tunable, e.g., in band gap or lattice constant. The result is ternary, quaternary, or even quinary compositions. Ternary compositions allow adjusting the band gap within the range of the involved binary compounds; however, in case of combination of direct and indirect band gap materials there is a ratio where indirect band gap prevails, limiting the range usable for optoelectronics; e.g. AlGaAs LEDs are limited to 660 nm by this. Lattice constants of the compounds also tend to be different, and the lattice mismatch against the substrate, dependent on the mixing ratio, causes defects in amounts dependent on the mismatch magnitude; this influences the ratio of achievable radiative/nonradiative recombinations and determines the luminous efficiency of the device. Quaternary and higher compositions allow adjusting simultaneously the band gap and the lattice constant, allowing increasing radiant efficiency at wider range of wavelengths; for example AlGaInP is used for LEDs. Materials transparent to the generated wavelength of light are advantageous, as this allows more efficient extraction of photons from the bulk of the material. That is, in such transparent materials, light production is not limited to just the surface. Index of refraction is also composition-dependent and influences the extraction efficiency of photons from the material.John Dakin, Robert G. W. Brown [https://books.google.com/books?id=3GmcgL7Z-6YC&dq=gas+discharge+properties+mercury+neon+hydrogen+deuterium&pg=PA57 Handbook of optoelectronics, Volume 1], CRC Press, 2006 {{ISBN|0-7503-0646-7}} p. 57
Types of semiconductor materials
- Group III elemental semiconductors, (B)
- Group IV elemental semiconductors, (C, Si, and Ge)
- Group IV compound semiconductors
- Group VI elemental semiconductors, (Se and Te)
- III–V semiconductors: Crystallizing with high degree of stoichiometry, most can be obtained as both n-type and p-type. Many have high carrier mobilities and direct energy gaps, making them useful for optoelectronics. (See also: Template:III-V compounds.)
- II–VI semiconductors: usually p-type, except ZnTe and ZnO which are n-type
- I–VII semiconductors
- IV–VI semiconductors
- V–VI semiconductors
- II–V semiconductors
- I–III–VI2 semiconductors
- Oxides
- Layered semiconductors
- Magnetic semiconductors
- Organic semiconductors
- Charge-transfer complexes
- Some of MOFs.
- Others
Compound semiconductors
{{more citations needed section|date=September 2021}}
A compound semiconductor is a semiconductor compound composed of chemical elements of at least two different species. These semiconductors form for example in periodic table groups 13–15 (old groups III–V), for example of elements from the Boron group (old group III, boron, aluminium, gallium, indium) and from group 15 (old group V, nitrogen, phosphorus, arsenic, antimony, bismuth). The range of possible formulae is quite broad because these elements can form binary (two elements, e.g. gallium(III) arsenide (GaAs)), ternary (three elements, e.g. indium gallium arsenide (InGaAs)) and quaternary alloys (four elements) such as aluminium gallium indium phosphide (AlInGaP)) alloy and Indium arsenide antimonide phosphide (InAsSbP). The properties of III-V compound semiconductors are similar to their group IV counterparts. The higher ionicity in these compounds, and especially in the II-VI compound, tends to increase the fundamental bandgap with respect to the less ionic compounds.{{Cite book|title=Fundamentals of Semiconductors|last1=Yu|first1=Peter|publisher=Springer-Verlag Berlin Heidelberg|year=2010|isbn=978-3-642-00709-5|pages=2|last2=Cardona|first2=Manuel|edition=4|doi=10.1007/978-3-642-00710-1|bibcode=2010fuse.book.....Y }}
=Fabrication=
Metalorganic vapor-phase epitaxy (MOVPE) is the most popular deposition technology for the formation of compound semiconducting thin films for devices.{{Citation needed|date=September 2009}} It uses ultrapure metalorganics and/or hydrides as precursor source materials in an ambient gas such as hydrogen.
Other techniques of choice include:
- Molecular-beam epitaxy (MBE)
- Hydride vapor-phase epitaxy (HVPE)
- Liquid phase epitaxy (LPE)
- Metal-organic molecular-beam epitaxy (MOMBE)
- Atomic layer deposition (ALD)
Table of semiconductor materials
Table of semiconductor alloy systems
The following semiconducting systems can be tuned to some extent, and represent not a single material but a class of materials.
class="wikitable sortable" | |||||||
rowspan=2 | Group
! rowspan=2 | Elem. ! rowspan=2 | Material class ! rowspan=2 | Formula ! rowspan=2 | Gap type ! rowspan=2 | Description | |||||||
---|---|---|---|---|---|---|---|
Lower | Upper | ||||||
IV-VI | 3 | Lead tin telluride | Pb1−xSnxTe | data-sort-value="0"| 0 | data-sort-value="290"| 0.29 | Used in infrared detectors and for thermal imaging | |
IV | 2 | Silicon-germanium | Si1−xGex | data-sort-value="670"| 0.67 | data-sort-value="1110"| 1.11 | direct/indirect | Adjustable band gap, allows construction of heterojunction structures. Certain thicknesses of superlattices have direct band gap.Yasantha Rajakarunanayake(1991) [https://thesis.library.caltech.edu/2857/ Optical properties of Si-Ge superlattices and wide band gap II-VI superlattices] Dissertation (Ph.D.), California Institute of Technology |
IV | 2 | Silicon-tin | Si1−xSnx | data-sort-value="1000"| 1.0 | data-sort-value="1110"| 1.11 | indirect | Adjustable band gap.{{cite journal|last1=Hussain|first1=Aftab M.|last2=Fahad|first2=Hossain M.|last3=Singh|first3=Nirpendra|last4=Sevilla|first4=Galo A. Torres|last5=Schwingenschlögl|first5=Udo|last6=Hussain|first6=Muhammad M.|title=Tin – an unlikely ally for silicon field effect transistors?|journal=Physica Status Solidi RRL|volume=8|issue=4|pages=332–335|doi=10.1002/pssr.201308300|bibcode = 2014PSSRR...8..332H |year=2014|s2cid=93729786 |url=https://zenodo.org/record/3447519}} |
III-V | 3 | Aluminium gallium arsenide | AlxGa1−xAs | data-sort-value="1420"| 1.42 | data-sort-value="2160"| 2.16 | direct/indirect | Direct band gap for x<0.4 (corresponding to 1.42–1.95 eV); can be lattice-matched to GaAs substrate over entire composition range; tends to oxidize; n-doping with Si, Se, Te; p-doping with Zn, C, Be, Mg. Can be used for infrared laser diodes. Used as a barrier layer in GaAs devices to confine electrons to GaAs (see e.g. QWIP). AlGaAs with composition close to AlAs is almost transparent to sunlight. Used in GaAs/AlGaAs solar cells. |
III-V | 3 | Indium gallium arsenide | InxGa1−xAs | data-sort-value="360"| 0.36 | data-sort-value="1430"| 1.43 | direct | Well-developed material. Can be lattice matched to InP substrates. Use in infrared technology and thermophotovoltaics. Indium content determines charge carrier density. For x=0.015, InGaAs perfectly lattice-matches germanium; can be used in multijunction photovoltaic cells. Used in infrared sensors, avalanche photodiodes, laser diodes, optical fiber communication detectors, and short-wavelength infrared cameras. |
III-V | 3 | Indium gallium phosphide | InxGa1−xP | data-sort-value="1350"| 1.35 | data-sort-value="2260"| 2.26 | direct/indirect | Used for HEMT and HBT structures and high-efficiency multijunction solar cells for e.g. satellites. Ga0.5In0.5P is almost lattice-matched to GaAs, with AlGaIn used for quantum wells for red lasers. |
III-V | 3 | Aluminium indium arsenide | AlxIn1−xAs | data-sort-value="360"| 0.36 | data-sort-value="2160"| 2.16 | direct/indirect | Buffer layer in metamorphic HEMT transistors, adjusting lattice constant between GaAs substrate and GaInAs channel. Can form layered heterostructures acting as quantum wells, in e.g. quantum cascade lasers. |
III-V | 3 | Aluminium gallium antimonide | AlxGa1−xSb | data-sort-value="700"| 0.7 | data-sort-value="1610"| 1.61 | direct/indirect | Used in HBTs, HEMTs, resonant-tunneling diodes and some niche optoelectronics. Also used as a buffer layer for InAs quantum wells. |
III-V | 3 | Aluminium indium antimonide | AlxIn1−xSb | data-sort-value="170"| 0.17 | data-sort-value="1610"| 1.61 | direct/indirect | Used as a buffer layer in InSb-based quantum wells and other devices grown on GaAs and GaSb substrates. Also used as the active layer in some mid-infrared LEDs and photodiodes. |
III-V | 3 | Gallium arsenide nitride | GaAsN | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 3 | Gallium arsenide phosphide | GaAsP | data-sort-value="1430"| 1.43 | data-sort-value="2260"| 2.26 | direct/indirect | Used in red, orange and yellow LEDs. Often grown on GaP. Can be doped with nitrogen. |
III-V | 3 | Aluminium arsenide antimonide | AlAsSb | data-sort-value="1610"| 1.61 | data-sort-value="2160"| 2.16 | indirect | Used as a barrier layer in infrared photodetectors. Can be lattice matched to GaSb, InAs and InP. |
III-V | 3 | Gallium arsenide antimonide | GaAsSb | data-sort-value="700"| 0.7 | data-sort-value="1420"| 1.42 | direct | Used in HBTs and in tunnel junctions in multi-junction solar cells. GaAs0.51Sb0.49 is lattice matched to InP. |
III-V | 3 | Aluminium gallium nitride | AlGaN | data-sort-value="3440"| 3.44 | data-sort-value="6280"| 6.28 | direct | Used in blue laser diodes, ultraviolet LEDs (down to 250 nm), and AlGaN/GaN HEMTs. Can be grown on sapphire. Used in heterojunctions with AlN and GaN. |
III-V | 3 | Aluminium gallium phosphide | AlGaP | data-sort-value="2260"| 2.26 | data-sort-value="2450"| 2.45 | indirect | Used in some green LEDs. |
III-V | 3 | Indium gallium nitride | InGaN | data-sort-value="2000"| 2 | data-sort-value="3400"| 3.4 | direct | InxGa1–xN, x usually between 0.02 and 0.3 (0.02 for near-UV, 0.1 for 390 nm, 0.2 for 420 nm, 0.3 for 440 nm). Can be grown epitaxially on sapphire, SiC wafers or silicon. Used in modern blue and green LEDs, InGaN quantum wells are effective emitters from green to ultraviolet. Insensitive to radiation damage, possible use in satellite solar cells. Insensitive to defects, tolerant to lattice mismatch damage. High heat capacity. |
III-V | 3 | Indium arsenide antimonide | InAsSb | data-sort-value="170"| 0.17 | data-sort-value="360"| 0.36 | direct | Primarily used in mid- and long-wave infrared photodetectors due to its small bandgap, which reaches a minimum of around 0.08 eV in InAs0.4Sb0.6 at room temperature. |
III-V | 3 | Indium gallium antimonide | InGaSb | data-sort-value="170"| 0.17 | data-sort-value="700"| 0.7 | direct | Used in some transistors and infrared photodetectors. |
III-V | 4 | Aluminium gallium indium phosphide | AlGaInP | data-sort-value="0"| | data-sort-value="0"| | direct/indirect | Also InAlGaP, InGaAlP, AlInGaP; for lattice matching to GaAs substrates the In mole fraction is fixed at about 0.48, the Al/Ga ratio is adjusted to achieve band gaps between about 1.9 and 2.35 eV; direct or indirect band gaps depending on the Al/Ga/In ratios; used for wavelengths between 560 and 650 nm; tends to form ordered phases during deposition, which has to be prevented |
III-V | 4 | Aluminium gallium arsenide phosphide | AlGaAsP | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Indium gallium arsenide phosphide | InGaAsP | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Indium gallium arsenide antimonide | InGaAsSb | data-sort-value="0"| | data-sort-value="0"| | Use in thermophotovoltaics. | |
III-V | 4 | Indium arsenide antimonide phosphide | InAsSbP | data-sort-value="0"| | data-sort-value="0"| | Use in thermophotovoltaics. | |
III-V | 4 | Aluminium indium arsenide phosphide | AlInAsP | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Aluminium gallium arsenide nitride | AlGaAsN | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Indium gallium arsenide nitride | InGaAsN | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Indium aluminium arsenide nitride | InAlAsN | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 4 | Gallium arsenide antimonide nitride | GaAsSbN | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 5 | Gallium indium nitride arsenide antimonide | GaInNAsSb | data-sort-value="0"| | data-sort-value="0"| | ||
III-V | 5 | Gallium indium arsenide antimonide phosphide | GaInAsSbP | data-sort-value="0"| | data-sort-value="0"| | Can be grown on InAs, GaSb, and other substrates. Can be lattice matched by varying composition. Possibly usable for mid-infrared LEDs. | |
II-VI | 3 | Cadmium zinc telluride, CZT | CdZnTe | data-sort-value="1400"| 1.4 | data-sort-value="2200"| 2.2 | direct | Efficient solid-state x-ray and gamma-ray detector, can operate at room temperature. High electro-optic coefficient. Used in solar cells. Can be used to generate and detect terahertz radiation. Can be used as a substrate for epitaxial growth of HgCdTe. |
II-VI | 3 | Mercury cadmium telluride | HgCdTe | data-sort-value="0"| 0 | data-sort-value="1500"| 1.5 | Known as "MerCad". Extensive use in sensitive cooled infrared imaging sensors, infrared astronomy, and infrared detectors. Alloy of mercury telluride (a semimetal, zero band gap) and CdTe. High electron mobility. The only common material capable of operating in both 3–5 μm and 12–15 μm atmospheric windows. Can be grown on CdZnTe. | |
II-VI | 3 | Mercury zinc telluride | HgZnTe | data-sort-value="0"| 0 | data-sort-value="2250"| 2.25 | Used in infrared detectors, infrared imaging sensors, and infrared astronomy. Better mechanical and thermal properties than HgCdTe but more difficult to control the composition. More difficult to form complex heterostructures. | |
II-VI | 3 | Mercury zinc selenide | HgZnSe | data-sort-value="0"| | data-sort-value="0"| | ||
II-V | 4 | Zinc cadmium phosphide arsenide | (Zn1−xCdx)3(P1−yAsy)2{{Cite journal|title=Compounds and solid solutions of the Zn-Cd-P-As system in semiconductor electronics|journal=Inorganic Materials|last1=Trukhan|first1=V. M.|volume=50|pages=868–873|last2=Izotov|first2=A. D.|issue=9|doi=10.1134/S0020168514090143|year=2014|last3=Shoukavaya|first3=T. V.|s2cid=94409384 }} | data-sort-value="0"| 0 | data-sort-value="1500"| 1.5{{Cite journal|title=Level Ordering in II3-V2 Semiconducting Compounds|journal=Physica Status Solidi B|last=Cisowski|first=J.|volume=111|pages=289–293|year=1982|issue=1|doi=10.1002/pssb.2221110132|bibcode=1982PSSBR.111..289C}} | Various applications in optoelectronics (incl. photovoltaics), electronics and thermoelectrics.{{Cite journal|title=II3V2 compounds and alloys|journal=Progress in Crystal Growth and Characterization of Materials|last=Arushanov|first=E. K.|volume=25|pages=131–201|issue=3|doi=10.1016/0960-8974(92)90030-T|year=1992}} | |
other | 4 | Copper indium gallium selenide, CIGS | Cu(In,Ga)Se2 | data-sort-value="1000"| 1 | data-sort-value="1700"| 1.7 | direct | CuInxGa1–xSe2. Polycrystalline. Used in thin film solar cells. |